Process Engineer × Workstyle: Cleanroom Duty

9 jobs found.

IC Production Operator

IC Production Operators operate semiconductor wafer manufacturing equipment in cleanrooms, managing and monitoring processes such as photolithography, etching, and film formation.

LSI Manufacturing Worker

Manufacturing operator who operates various process equipment for semiconductor wafers in a cleanroom, responsible for processes such as photolithography, etching, film formation, CMP, cleaning, and inspection.

Partial Deposition Worker (Quartz Oscillator)

A manufacturing technician who partially deposits metal in a vacuum to form electrodes on quartz oscillators.

Hermetic Seal Worker (Semiconductor Manufacturing)

Technical job responsible for the sealing process to hermetically seal semiconductor devices from the external environment, ensuring performance stability and long-term reliability.

Semiconductor Wafer Cleaning Worker

In semiconductor manufacturing processes, removes contaminants and microparticles from wafer surfaces using chemicals, ultrapure water, and specialized equipment to support improved yield in subsequent processes.

Semiconductor Silicon Manufacturing Worker

This occupation involves a series of processes from raw material purification to pulling, cutting, polishing, and cleaning in the silicon wafer manufacturing process to produce high-quality semiconductor substrates.

Semiconductor Chip Manufacturing Worker

A job that operates and manages semiconductor chip manufacturing processes such as photolithography, etching, and film formation in a cleanroom.

Semiconductor Electrode Formation Worker

Manufacturing operator who forms metal thin films that become electrodes on semiconductor wafers with high precision. Operates and manages thin film formation processes using vacuum equipment and plasma technology to improve product yield and stabilize quality.

Resist Coating Worker (Integrated Circuit Manufacturing)

Manufacturing job that uniformly applies photoresist on semiconductor wafers to form the film thickness that serves as the basis for the exposure process.